Articles Date Title Publication Molecular Imprints Mar 2010 Lithography Cost of Ownership: Fact and Fiction Semiconductor International Sep 2009 The Industry’s Coming Lithography Transition Semiconductor International Jun 2009 Molecular Imprints’ J-FILN Nanopatterning Solution Continues to Gain Momentum in NVM Markets azonano May 2008 MII Tackles Patterned Media Opportunity Semiconductor International Lithography Aug 2009 The Industry’s Coming Lithography Transition Reed Business Information Mar 2009 SPIE observations: EUV vs. “all other” litho Solid State Technology Photomask Dec 2009 BACUS News is published monthly by SPIE for BACUS, EUV Challenge for “New Economy” Photomask Apr 2009 SPIE Observations: EUV vs. “All Other” Litho Photomask Jan 2005 SEMI Oral History Interview: Ken Rygler SEMI Jun 2004 Photomask Costs: Damming the Rising Tide FutureFab May 2004 Focus on mask yield for lower cost designs IEEE.org Nov 2001 DuPont Photomasks Announces Resignation of Kenneth A. Rygler; Founder of DuPont Photomasks to Assume Consulting Role Press Release Oct 2001 Creative ways to cut costs EE Times Aug 2001 Cost, manufacturability limit lithography extensions thinfilmmfg.com Oct 2000 AMD Successfully Utilizes Canary ESD Service From DuPont Photomasks And ION To Protect Photomasks In Fab 25 The Free Library Jun 1999 Mask Costs Jumping EDN Aug 1997 Masking the Complexities of Chip Development Wired High costs of mask sets and design force industry change Semiconductors X Initiative Jan 2007 X architecture marks the spot for good yields, supporters say Micro Magazine Oct 2003 DuPont Photomasks’ Results Confirm Manufacturability Using Conventional Equipment EDACafe Jun 2003 Waiting for X Architecture EDN Jun 2003 X Initiative Honors STMicroelectronics with DFM Catalyst Award Press Release Jun 2003 More details emerge on 90-nm X-Initiative chip EE Times Apr 2003 The X Architecture: Roadmap for Design for Manufacturing Methodology X Initiative Mar 2003 X Initiative panel makes plea for DF EE Times DFM May 2008 Gauda, Inc. , the Company that Accelerates Computational Lithography, Announces its Advisory Board Press Release Feb 2007 DFM and DFY: Old Solutions to New Problems Chip Design Magazine Jul 2005 Challenges seen for seamless DFM, says expert EE Times Asia Jun 2005 Updated: Speakers spar over foundry-versus-IDM models Finance Tech Aug 2004 Hefty compute power clears up mask imaging EE Times Jan 2004 Wanted: New class of engineering generalists for DFM EE Times Asia Jan 2000 The semiconductor industry chain re-integration, wafer foundry and IDM sparked controversy prospects wangchao.org Confab Jan 2010 2010 Advisory Board The Confab